JEMH Editorial Review Board

Editors

• Chris Klotschkow, AACE, USA
• Chris Marks, AACE, USA
• Gary Marks, AACE, USA
• Jordan Reiter, AACE, USA

Editorial Review Board

• Tel Amiel, Univ. of Georgia, USA
• Lora Aroyo, Eindhoven Univ. of Technology, Netherlands
• Savilla Banister, Bowling Green State Univ., USA
• Dale Banks, Saint Mary's College, USA
• Randall Boone, Univ. of Nevada Las Vegas, USA
• Gwyn Brickell, Australia
• Robert Corderoy, Univ. of Wollongong, Australia
• Caroline Crawford, Univ. of Houston - Clear Lake, USA
• Nada Dabbagh, George Mason Univ., USA
• Christopher Douce, Institute of Educational Technology, UK
• Edward Fox, Virginia Polytechnic Institute & State Univ., USA
• Joseph Frantiska Jr., Walden Univ., USA
• Gary Grandon, American Hebrew Academy, USA
• Patrick Greene, Florida Gulf Coast Univ., USA
• Kendall Hartley, Univ. of Nevada, Las Vegas, USA
• Carrie Heeter, Michigan State Univ., USA
• Donald Hsu, Dominican College, USA
• Natalie Johnson, Arkansas State Univ., USA
• David M. Kennedy, Lingnan Univ. in Hong Kong, Hong Kong
• Professor Kinshuk, Athabasca Univ., Canada
• Harald Krottmaier, IICM, Graz, Univ. of Technology, Austria
• Réagan Lorraine (Edith) Lavorata, Adjunct Instructor of Business and Technology, USA
• John Leggett, Texas A&M Univ., USA
• Ray McAleese, Heriot-Watt Univ., UK
• Peter McKenna, Manchester Metropolitan Univ., UK
• Christina Metaxaki-Kossionides, Demokritos Univ. of Thrace, Greece
• Wayne Nelson, Southern Illinois Univ., USA
• Mehryar Nooriafshar, Edith Cowan Univ., Australia
• Manuel Pérez Cota, Univ. of Vigo, Spain
• Davina Pruitt-Mentle, UMCP, USA
• Riccardo Rizzo, ICAR-CNR, Italy
• Jaime Sánchez, Univ. of Chile, Chile
• Mark Schofield, Edge Hill Univ., UK
• Peter B. Sloep, Open Univ. Nederland, Netherlands
• Nishikant Sonwalkar, MIT, USA
• David Stoloff, USA
• Martin Wessner, Fraunhofer IESE, Germany
• Peter Zoller, Wichita State Univ., USA